Trion Technology

Manufacturer of Plasma Etch & Deposition Systems for Over 25 Years

  • Home
  • Plasma Ashing
    • Apollo Stripper
    • Gemini Multi-Chamber Stripper
  • Etch Platform
    • Phantom RIE
    • Phantom RIE ICP
    • Phantom RIE ICP Cryo
    • Minilock – Phantom RIE
    • Minilock – Phantom RIE ICP
    • Minilock – Phantom DRIE
    • Minilock – Phantom Duo
    • Titan Loadlocked RIE with VCE
    • Oracle Cluster
  • Deposition Products
    • Orion PECVD
    • Orion HDCVD
    • Minilock-Orion PECVD
    • Minilock PVD
    • Minilock ALD
    • Minilock Duo
    • Titan Deposition with VCE
    • Oracle Cluster
  • Process
    • Ashing
    • Etching
      • Dielectric Etching
      • Compound Etching
      • Metal Etching
      • Silicon Etching
    • Deposition
      • Plasma Enhanced Chemical Vapor Deposition
      • High-Density Chemical Vapor Deposition (HDCVD)
    • Processing Techniques
      • Reactive Ion Etch (RIE)
      • Inductively Coupled Plasma (ICP)
      • Deep Reactive Ion Etching (DRIE)
      • Plasma Enhanced Chemical Vapor Deposition (PECVD)
      • High Density Chemical Vapor Deposition (HD CVD)
      • Physical Vapor Deposition (PVD)
      • Atomic Layer Deposition (ALD)
      • Typical Features
      • FAQs
  • Service
    • Service News
  • About
    • Blog
    • Calendar of Events
  • Contact
Navigation Menu
Home » Posts by trion
Zoom in Read more
Zoom in Read more
Zoom in Read more
Zoom in Read more
2006 Zoom in Read more
Zoom in Read more
Zoom in Read more
Zoom in Read more
2005 Zoom in Read more
2004 Zoom in Read more
2002 Zoom in Read more
2001 Zoom in Read more
« Older Entries
Next Entries »

©2023 Trion Technology. All Rights Reserved. Website design & hosting provided by Visual Edge Design