Apollo Stripper

Apollo Stripper

Apollo Photoresist Stripper

The cost of new photoresist stripping systems has escalated to unreasonable levels. Trion has solved this critical problem. The Apollo Stripper is a compact, inexpensive, and versatile system which can be configured for a 200mm or 300mm Chuck. By employing RF bias power, difficult to remove layers of resist can be removed at low temperatures. As required by application, this system can incorporate a microwave source (which is both reliable and free from typical microwave tuning problems) or ICP technology.

Apollo Stripper Brochure

Stripper CHARM® 2 Report and Wafer Maps

  • Etch rates up to 6um/min
  • High throughput
  • Low plasma damage
  • Automatic tuning
  • 100mm to 300mm wafers
  • Small footprint
  • Competitively priced

Inductively Coupled Plasma (ICP) Option:
High Rate and Low Damage Photoresist Stripping is a critical necessity in modern semiconductor manufacture. As more and more masking steps and more sensitive devices have come into use, “plasma downstream ashing” has become the primary method of resist removal. The Trion Apollo Photoresist Stripper incorporates a downstream Inductively Coupled Plasma (ICP) to provide the high rate and uniform removal this application requires.

The Trion Apollo system was specifically designed for production Photoresist Descum and Stripping. This extremely reliable system provides a compact and inexpensive solution to this application.

Multi-Chamber Option:

Gemini Multi-Chamber Stripper

The Gemini is a compact multi-chamber, high throughput photoresist stripping system that is designed specifically for the demands of today’s production fabs.


Photoresist Stripper Descum Application Note

“The descum operation of the Trion Photoresist Stripping platform was characterized, exploring the effects of various factors.

To complete this task, a series of runs were made in an effort to obtain relationships of non-uniformity and ash rate versus run length, power, pressure, oxygen flow, chuck temperature, DC bias, and photoresist coverage. The data was taken by varying each parameter above and below an optimized descum process. The conditions of this recipe were …”

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View the Apollo and Gemini in Action!

The [Apollo] system is working in production almost a year, with close to zero down time (single event of particles released from the Viton O-Rings that were de-composed — I changed the O-Rings and clean and it went back to normal). They only clean the chamber and it runs and runs!” – Trion Customer (Israel)


MEMS, Compound Semiconductor, Pilot Line Production.


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