Titan Deposition with VCE

Titan Loadlocked RIE with VCE

Trion Introduces the Titan at SEMICON West 2007

Trion Introduces the Titan at SEMICON West 2007

The production proven Titan Deposition is a loadlocked deposition system with a vacuum cassette elevator. It can be configured for PECVD, HDCVD, PVD, or ALD. The Titan Deposition provides innovative, and leading edge processes in a small footprint at an affordable price.

Standard production processes have been developed for repeatable deposition of SiOx, SiNx, SiC, and a-Si. All backed by over 25 years’ experience in rapid process development.

System Features:

  • PLC and touch screen control
  • Electrostatic, or mechanical chuck
  • Active substrate temperature control
  • Vacuum Cassette Elevator
  • Optional laser, and optical endpoints

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