Plasma Ashing

Plasma ashing is the process of removing the photoresist from an etched wafer. Using a plasma source, a monatomic reactive species is generated. Oxygen or fluorine are the most common reactive species. The reactive species combines with the photoresist to form ash which is removed with a vacuum pump.


Apollo Stripper


Gemini Multi-Chamber Stripper

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Apollo Photoresist Strip Tool

Gemini Multi-Chamber Photoresist Stripping System

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