High-Density Chemical Vapor Deposition (HDCVD)
Posted by trion on Jul 15, 2020 in | Comments Off on High-Density Chemical Vapor Deposition (HDCVD)
PAPERS:
- Poly-Si TFT Fabricated at 170 Degrees Celcius Using ICP-CVD and Excimer Laser Annealing for Plastic Substrates by Sang-Myeon Han, Moon-Young Shin, Joong-Hyun Park, Hye-Jin Lee and Min-Koo Han, Seoul National University
- P-13: Poly-Si TFT Fabricated at 170 Degrees Celcius Using ICP-CVD and Excimer Laser Annealing for Plastic Substrates by Moon-Young Shin, Sang-Myeon Han, Min-Cheol Lee, Hee-Sun Shin, Min-Koo Han (Seoul National University); and Jang-Yeon Kwon, Takashi Noguchi (Samsung Advanced Institute of Technology, Korea)
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