The Minilock – Phantom RIE is a Reactive Ion Etch system with a vacuum loadlock. The Loadlock allows the main chamber to continue pumping whilst a sample is loaded, or unloaded, and is ideal for toxic gas chemistries.
The system is highly configurable with such options as a ICP, and endpoint.
“We have just placed an order for two more Trions. That will make four systems in our facility. We have two RIE’s currently, a Minilock and a Phantom III. We just ordered an ICP-RIE and a PECVD system which are being put into production as we speak. We love your systems and even more we love the support we get from Trion Technology. Have a great day!” – Bruce E. Tolleson, Rochester Institute of Technology
View the Minilock in action!
Compound Semiconductor, Failure Analysis, Research & Development, Pilot Line.