Posted by trion on Sep 21, 2014 in | 0 comments
All information will be kept confidential.
Name *
Company *
Phone *
Email *
Country *
Address 1
Address 2
City, State
Zip/Post Code
Quote Type:
Budgetary QuoteFormal QuoteTechnical Detail Required
Process:
EtchSingleDepositBatchStrip
Substrate Process Loading:
ManualCassetteLoadlock
Substrate:
Die Dim: W: 50 x 50mm
2. Die Dim: W: x mm | Thickness: µ
3. Die Dim: W: x mm | Thickness: µ
4. Die Dim: W: x mm | Thickness: µ
1. Full Wafer: RoundSquare
Dim: Thickness: µ
2. Full Wafer: RoundSquare
3. Full Wafer: RoundSquare
4. Full Wafer: RoundSquare
Substrate Base Material:
1. 2.
3. 4.
5. 6.
7. 8.
9.
Substrate Layer Material/Type To Be Etched/Deposited:
1. Polyimide 2. PMMA
Substrate Layer Material Thickness And Uniformity:
1. µ/Å 2. µ/Å
3. µ/Å 4. µ/Å
5. µ/Å 6. µ/Å
7. µ/Å 8. µ/Å
9. µ/Å
Process Recipe: Customer SupplyWith Tool
If Customer Provided Recipe, Please Provide Details:
Gases Used:
Dopant Level:
Thickness/Uniformity: µ/Å
Topography:
Mask Type And Thickness:
Other Mask Type:
Thickness:
Minimum Line Width:
% Surface Coverage By Photoresist Or Other Mask: %
Desired Uniformity:
Across Wafer: +/- %
Wafer to Wafer: +/- %
FACILITIES
Voltage Power Available:
Volt:
Ampere:
# Of Phases:
HZ:
Chill Water (PCW) (12°C > 18°C): In-HouseWith Tool
Compressed Air (CDA):
PSI/Bar:
CFM:
Vacuum:
Rough Vac: Customer SupplyWith Tool
High Vac: Customer SupplyWith Tool
Turbo Molecular Pump: Customer SupplyWith Tool
Dry Pump: Customer SupplyWith Tool