Manufacturer of Plasma Etch & Deposition Systems for Over 25 Years
Home
Plasma Ashing
Apollo Stripper
Gemini Multi-Chamber Stripper
Etch Platform
Phantom RIE
Phantom RIE ICP
Phantom RIE ICP Cryo
Minilock – Phantom RIE
Minilock – Phantom RIE ICP
Minilock – Phantom DRIE
Minilock – Phantom Duo
Titan Loadlocked RIE with VCE
Oracle Cluster
Deposition Products
Orion PECVD
Orion HDCVD
Minilock-Orion PECVD
Minilock PVD
Minilock ALD
Minilock Duo
Titan Deposition with VCE
Oracle Cluster
Process
Ashing
Etching
Dielectric Etching
Compound Etching
Metal Etching
Silicon Etching
Deposition
Plasma Enhanced Chemical Vapor Deposition
High-Density Chemical Vapor Deposition (HDCVD)
Processing Techniques
Reactive Ion Etch (RIE)
Inductively Coupled Plasma (ICP)
Deep Reactive Ion Etching (DRIE)
Plasma Enhanced Chemical Vapor Deposition (PECVD)
High Density Chemical Vapor Deposition (HD CVD)
Physical Vapor Deposition (PVD)
Atomic Layer Deposition (ALD)
Typical Features
FAQs
Service
Service News
About
Blog
Calendar of Events
Contact
Navigation Menu
Home
»
Blog
»
1990
Production Tools
Apollo Stripper
Gemini Multi-Chamber Stripper
Oracle Cluster
Titan Loadlocked RIE with VCE
Titan Deposition with VCE
Research/Pilot Line Tools
Deposition Products
Minilock ALD
Minilock Duo
Minilock-Orion PECVD
Minilock PVD
Oracle Cluster
Orion HDCVD
Orion PECVD
Etch Platform
Minilock – Phantom DRIE
Minilock – Phantom Duo
Minilock – Phantom RIE ICP
Minilock – Phantom RIE
Oracle Cluster
Phantom RIE ICP
Phantom RIE ICP Cryo
Phantom RIE
1990
Posted by
trion
on Sep 2, 1990 in
Blog
|
Comments Off
on 1990
Trion delivers the first tool to AMD.