Products - Lab Platform - Sirus T2 Table Top
Sirus T2 Table Top Reactive Ion Etch (RIE) System |
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The Sirus T2 Reactive Ion Etcher is a basic plasma etching system designed to etch dielectrics and other films that require fluorine-based chemistries. The small footprint and robust design make it ideal for the lab environment.
| Applications |
| MEMS, Solid State Lighting, Failure Analysis, Research & Development, Pilot Line. |
Fluorine Etch Processes
(SF6, CF4, CHF3, O2) |
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Carbon |
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Quartz |
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Epoxy |
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Si |
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GaAs/AlGaAs |
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SiO2 |
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InSb |
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Si3N4 |
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Ir |
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SiC |
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Mo |
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Ta |
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Nb |
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TaN |
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OxyNitride |
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TiW |
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Polyimide |
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TiN |
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Pr (e.g: SiLK or SU8) |
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W |
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Sirus T2 reactor with 200mm bottom electrode |
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System controller (includes Pentium™ based computer and touch screen interface) |
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Two mass flow controllers |
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Automatic tuning with 13.56 MHz 600 watt RF generator |
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Emergency Off system |
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Automatic pressure control package (butterfly valve with capacitance manometer for pressure measurement) |
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12 month limited warranty |
| Optional Features |
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Recirculating temperature controller |
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Up to two additional mass flow controllers |
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| Pumps |
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170 l/s turbo |
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23.3 cfm rotary vane pump with oil filtration, demister, and Fomblin oil |
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For Technical Articles and SEMS,
please visit our Applications Page.
Download the Sirus T2 brochure.
This brochure is in PDF format. If you do not have Adobe Acrobat Reader, Click Here.
Click Here for more information.
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