Atomic Layer Deposition (ALD)

Atomic Layer Deposition is the sequential use of a gas phase chemical process using two chemicals, typically called precursors.

With Plasma ALD, one of the liquid precursors is replaced with a Plasma gas which can reduce material costs, can help with ALD growth at lower temperatures, and has had success at growing metals such as Ru.

ald-reaction-steps

 

There have been many papers indicating growth of compounds. Some are highlighted in the periodic table below.

periodic-table-of-ald-growth

Minilock ALD


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