Titan Deposition with VCE
Trion Introduces the Titan at SEMICON West 2007
The production proven Titan Deposition is a loadlocked deposition system with a vacuum cassette elevator. It can be configured for PECVD, HDCVD, PVD, or ALD. The Titan Deposition provides innovative, and leading edge processes in a small footprint at an affordable price.
Standard production processes have been developed for repeatable deposition of SiOx, SiNx, SiC, and a-Si. All backed by over 25 years’ experience in rapid process development.
- PLC and touch screen control
- Electrostatic, or mechanical chuck
- Active substrate temperature control
- Vacuum Cassette Elevator
- Optional laser, and optical endpoints