The Minilock ALD system has been designed to provide researchers with the capability to grow Atomic Layer Deposition films through both thermal, and plasma-enhanced modes for substrate sizes up to 300mm. The small footprint and robust design make it ideal for research, and pilot line environments. A biased electrode is standard, which can be used to change the film properties.
By keeping our core components the same, it is very easy to scale to a production cluster platform.
Standard processes have been developed for various materials. This is backed by over 25 years’ experience in rapid process development.